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https://elib.bsu.by/handle/123456789/340289| Title: | Microstructure of binary “metal-silicon” systems treated by low-energy high-current electron beams |
| Authors: | Koval, N.N. Uglov, V.V. Ivanov, Yu.F. Petukhou, Yu.A. Kudaktsin, R.S. Teresov, A.D. Kalin, A.V. |
| Open Researcher and Contributor ID: | 0000-0003-1929-4996 |
| Keywords: | ЭБ БГУ::ТЕХНИЧЕСКИЕ И ПРИКЛАДНЫЕ НАУКИ. ОТРАСЛИ ЭКОНОМИКИ::Электроника. Радиотехника |
| Issue Date: | 2012 |
| Publisher: | Kovcheg |
| Citation: | Plasma physics and plasma technology, Minsk, Belarus, 17–21 сентября 2012 года. Vol. Volume I. – Minsk, Belarus: Kovcheg, 2012. – P. 380-383 |
| Abstract: | In this communication we discuss peculiarities of microstructural changes in “metal layer (Ti, Zr, Cr)-silicon substrate” systems treated by LEHCEB with energy density 8-15 J/cm2 and pulse duration 50-200 μs. As it was shown in recent papers /2/, energy density of LEHCEB is sufficient for melting of the surface layer; therefore, mechanisms of structural transformation are mainly caused by solidification of the surface melt. |
| URI: | https://elib.bsu.by/handle/123456789/340289 |
| Licence: | info:eu-repo/semantics/openAccess |
| Appears in Collections: | Кафедра физики твердого тела и нанотехнологий (статьи) |
Files in This Item:
| File | Description | Size | Format | |
|---|---|---|---|---|
| Коваль.pdf | 1,08 MB | Adobe PDF | View/Open |
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