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Please use this identifier to cite or link to this item: https://elib.bsu.by/handle/123456789/210818
Title: Использование TiN в качестве барьерного слоя в системе металлизации Ti/TiN/Au при формировании низкоомных контактов к алмазу
Authors: Соловьев, Валерий Сергеевич
Гусаков, Григорий Анатольевич
Крекотень, Олег Владимирович
Keywords: ЭБ БГУ::ЕСТЕСТВЕННЫЕ И ТОЧНЫЕ НАУКИ::Физика
Issue Date: 2003
Publisher: Минск : БГУ
Citation: Вестник Белорусского государственного университета. Сер. 1, Физика. Математика. Информатика. – 2003. - № 1. – С. 42-45.
Abstract: The composition of titanium and titanium nitride films deposited on the synthetic diamond using the method magnetron sputtering has been studied. It is shown that annealing at high temperature (700-800 °C) leads to the formation of a titanium carbide layer at the diamond/Ti interface. Nitrogen does not diffuse into carbide layer and adjacent region of diamond. Titanium nitride layer also is a good diffusion barrier for titanium and gold deposited on the nitride surface.
URI: http://elib.bsu.by/handle/123456789/210818
ISSN: 0321-0367
Licence: info:eu-repo/semantics/openAccess
Appears in Collections:2003, №1 (январь)

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