Logo BSU

Please use this identifier to cite or link to this item: https://elib.bsu.by/handle/123456789/204271
Title: Эволюция дислокаций в кремнии при водородной плазменной обработке
Other Titles: Evolution of dislocations in silicon during hydrogen plasma treatment / O. V. Milchanin, P. I. Gaiduk
Authors: Мильчанин, О. В.
Гайдук, П. И.
Keywords: ЭБ БГУ::ЕСТЕСТВЕННЫЕ И ТОЧНЫЕ НАУКИ::Физика
Issue Date: 1999
Publisher: Минск : БГУ
Citation: Взаимодействие излучений с твердым телом: Материалы III междунар. науч. конф., 6-8 окт. 1999 г., Минск: В 2 ч. Ч.1. — Мн.: БГУ, 1999. — С. 57-59.
Abstract (in another language): Structure changes in semiconductors caused by hydrogen plasma treatment are the subject of great interest due to passivation of defect levels in the gap. On the other hand tine reactions between extended and hydrogen-induced defects in silicon are interested for the development of new defect engineering concepts. In this paper the processes of defects formation and evolution in p‘- and nł-type crystalline silicon during hydrogen plasma treatment are investigated by transmission electron microscopy. Three types of hydrogen-induced defects are observed during hydrogen plasma treatment in both samples. At the same time the great distinctions in structure of pre-existing extended and hydrogen-induced defects were found to take place in p'-Si in comparison with n+-Si. A model is proposed wherein the observed structure changes are discussed as a result of formation, diffusion and decay of the complexes which consist of hydrogen, dopant and point defects.
URI: http://elib.bsu.by/handle/123456789/204271
ISBN: 985-445-236-0
Appears in Collections:1999. Взаимодействие излучений с твердым телом

Files in This Item:
File Description SizeFormat 
57-59.pdf601,53 kBAdobe PDFView/Open
Show full item record Google Scholar



Items in DSpace are protected by copyright, with all rights reserved, unless otherwise indicated.