Advanced Ion Beam and Photon Processings of Materials for Micro-, Opto- and Nanoelectronics / F.F. Komarov, A.R. Chelyadinskii

Abstract

The text-book focuses on the main ways of solving problems of semiconductor materials. Radiation defects, their accumulation, structure transformation into residual damage, influence on electrical activation and diffusion of impurities, formation of inclusions of the impurity second phase and methods of suppression of damage in implanted silicon are analyzed. It is demonstrated that using specially implanted impurities or defects we can fight impurities and defects.