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https://elib.bsu.by/handle/123456789/342815| Title: | Effect of compressed plasma flow of structure-phase transformations of Tantalum-Silicon Systems |
| Authors: | Astashynski, V.M. Sari, A.H. Kuzmitski, A.M. Petukhou, Yu.A. Uglov, V.V. Filatov, S.A. |
| Open Researcher and Contributor ID: | 0000-0003-1929-4996 |
| Keywords: | ЭБ БГУ::ТЕХНИЧЕСКИЕ И ПРИКЛАДНЫЕ НАУКИ. ОТРАСЛИ ЭКОНОМИКИ::Металлургия ЭБ БГУ::ЕСТЕСТВЕННЫЕ И ТОЧНЫЕ НАУКИ::Физика |
| Issue Date: | 2012 |
| Publisher: | Kovcheg |
| Citation: | Plasma physics and plasma technology : Volume II (Sections 4-6), Minsk, 17–21 сентября 2012 года. – Minsk: Kovcheg, 2012. – P. 499-502 |
| Abstract: | The use of CPF on Ta/Si system results in the formation of metal coating composed from spherical clusters and nanostructures (~20 to 100 nm). Metal and silicon intermixing via CPF action results creation of tantalum silicides. The tantalum silicides mostly are in the form of hexagonal Si1-xTa3+x and have been created for both Si(111) and Si(100) substrates. Formation of nanocluster is provided by condensation of cluster vapor on silicon in shock-compressed plasma layer. Results of studies show great potential of CPF application for the development of novel nanostructured metal-silicide materials for magnetic, thermoelectric and photovoltaic applications. |
| URI: | https://elib.bsu.by/handle/123456789/342815 |
| Licence: | info:eu-repo/semantics/openAccess |
| Appears in Collections: | Кафедра физики твердого тела и нанотехнологий (статьи) |
Files in This Item:
| File | Description | Size | Format | |
|---|---|---|---|---|
| Асташинский1.pdf | 792,66 kB | Adobe PDF | View/Open |
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