Effect of compressed plasma flow of structure-phase transformations of Tantalum-Silicon Systems

Abstract

The use of CPF on Ta/Si system results in the formation of metal coating composed from spherical clusters and nanostructures (~20 to 100 nm). Metal and silicon intermixing via CPF action results creation of tantalum silicides. The tantalum silicides mostly are in the form of hexagonal Si1-xTa3+x and have been created for both Si(111) and Si(100) substrates. Formation of nanocluster is provided by condensation of cluster vapor on silicon in shock-compressed plasma layer. Results of studies show great potential of CPF application for the development of novel nanostructured metal-silicide materials for magnetic, thermoelectric and photovoltaic applications.