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Please use this identifier to cite or link to this item: https://elib.bsu.by/handle/123456789/342374
Title: Influence of deposition parameters on structure and thermal stability of Ti-Al-n coatings prepared by reactive magnetron sputtering
Authors: Klimovich, I.M.
Komarov, F.F.
Ljudchik, O.R.
Zaikov, V.V.
Keywords: ЭБ БГУ::ТЕХНИЧЕСКИЕ И ПРИКЛАДНЫЕ НАУКИ. ОТРАСЛИ ЭКОНОМИКИ::Машиностроение
Issue Date: 2015
Publisher: Kovcheg
Citation: Plasma Physics and Plasma Technology : VIII International Conference, Minsk, Belarus, 14–18 сентября 2015 года. – Minsk, Belarus: Kovcheg, 2015. – P. 546-549
Abstract: Ti-Al-N coatings were obtained by reactive magnetron sputtering method under different deposition parameters (substrate temperature, bias voltage and reactive gas flow). Structure and elemental composition of films were determined by scanning electron microscopy and energy dispersive X-ray analysis, respectively. Thermal stability of Ti-Al-N coatings was studied by Raman spectroscopy after annealing in air at various temperatures (550 °C, 650 °C and 700 °C). It was found that selection of appropriate deposition parameters allows to obtain Ti-Al-N coating with improved thermal stability
URI: https://elib.bsu.by/handle/123456789/342374
Licence: info:eu-repo/semantics/openAccess
Appears in Collections:Кафедра квантовой радиофизики и оптоэлектроники. Статьи

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