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  1. Электронная библиотека БГУ
  2. Факультет радиофизики и компьютерных технологий
  3. НАУЧНЫЕ ПУБЛИКАЦИИ ФАКУЛЬТЕТА РАДИОФИЗИКИ И КОМПЬЮТЕРНЫХ ТЕХНОЛОГИЙ
  4. Статьи сотрудников факультета радиофизики и компьютерных технологий
  5. Кафедра квантовой радиофизики и оптоэлектроники. Статьи
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Please use this identifier to cite or link to this item: https://elib.bsu.by/handle/123456789/342374
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dc.contributor.authorKlimovich, I.M.-
dc.contributor.authorKomarov, F.F.-
dc.contributor.authorLjudchik, O.R.-
dc.contributor.authorZaikov, V.V.-
dc.date.accessioned2026-02-24T14:16:55Z-
dc.date.available2026-02-24T14:16:55Z-
dc.date.issued2015-
dc.identifier.citationPlasma Physics and Plasma Technology : VIII International Conference, Minsk, Belarus, 14–18 сентября 2015 года. – Minsk, Belarus: Kovcheg, 2015. – P. 546-549ru
dc.identifier.urihttps://elib.bsu.by/handle/123456789/342374-
dc.description.abstractTi-Al-N coatings were obtained by reactive magnetron sputtering method under different deposition parameters (substrate temperature, bias voltage and reactive gas flow). Structure and elemental composition of films were determined by scanning electron microscopy and energy dispersive X-ray analysis, respectively. Thermal stability of Ti-Al-N coatings was studied by Raman spectroscopy after annealing in air at various temperatures (550 °C, 650 °C and 700 °C). It was found that selection of appropriate deposition parameters allows to obtain Ti-Al-N coating with improved thermal stabilityru
dc.language.isoenru
dc.publisherKovchegru
dc.rightsinfo:eu-repo/semantics/openAccessru
dc.subjectЭБ БГУ::ТЕХНИЧЕСКИЕ И ПРИКЛАДНЫЕ НАУКИ. ОТРАСЛИ ЭКОНОМИКИ::Машиностроениеru
dc.titleInfluence of deposition parameters on structure and thermal stability of Ti-Al-n coatings prepared by reactive magnetron sputteringru
dc.typeconference paperru
dc.rights.licenseCC BY 4.0ru
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