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https://elib.bsu.by/handle/123456789/240520| Title: | The formation of low-dimensional structures by compressive plasma flows |
| Authors: | Uglov, V. V. Anishchik, V. M. Cherenda, N. N. Sveshnikov, Yu. V. Astashynski, V. M. |
| Keywords: | ЭБ БГУ::ЕСТЕСТВЕННЫЕ И ТОЧНЫЕ НАУКИ::Физика |
| Issue Date: | 2005 |
| Publisher: | Elsevier B.V. |
| Citation: | Surface & Coatings Technology 200 (2005) 297 – 300 |
| Abstract: | The process of the deposition of low-dimensional structures on the silicon surface exposed to the compression plasma flow has been studied. Scanning electron microscopy, transmission electron microscopy and Rutherford backscattering spectroscopy have been used to analyze the morphology, microstructure and elemental composition of the near-surface layer. The deposited coating consists of a spherical metal containing particles with a size of 50–200 nm. Possible mechanism of the coating formation is discussed. |
| URI: | http://elib.bsu.by/handle/123456789/240520 |
| DOI: | 10.1016/j.surfcoat.2005.02.007 |
| Appears in Collections: | Кафедра физики твердого тела и нанотехнологий (статьи) |
Files in This Item:
| File | Description | Size | Format | |
|---|---|---|---|---|
| SCT_200_2005_1.pdf | 639,68 kB | Adobe PDF | View/Open |
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