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Please use this identifier to cite or link to this item: https://elib.bsu.by/handle/123456789/170161
Title: Structure of Thin-Film Nickel-Carbon Composites Formed by Microwave Plasma-Enhanced Chemical Vapor Deposition
Authors: Uglov, V. V.
Astashynskaya, M. V.
Kuleshov, A. K.
Samtsov, M. P.
Barna, P. B.
Keywords: ЭБ БГУ::ЕСТЕСТВЕННЫЕ И ТОЧНЫЕ НАУКИ::Физика
Issue Date: 2011
Publisher: Pleiades Publishing, Ltd
Citation: Journal of Surface Investigation. X-ray, Synchrotron and Neutron Techniques. - 2011. - Vol. 5, No. 4. - Pp. 791–795.
Abstract: The results of structure research of thin-film nickel–carbon hydrogenated composites formed by the method of the combination of plasma-enhanced chemical vapor deposition of carbon from mixture of reactive gases (Ar + CH4) and physical sputtering of the nickel target are presented. It has been established in the study of composites by transmission electron microscopy that the microstructure of thin-film composites changed from fragmenting columnar to finely dispersed with increase in carbon concentration
URI: http://elib.bsu.by/handle/123456789/170161
ISSN: 1027-4510
Appears in Collections:Статьи сотрудников НИИ ПФП

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