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Please use this identifier to cite or link to this item: https://elib.bsu.by/handle/123456789/342823
Title: Laser plasma deposition of the thin alumunium films in vacuum
Authors: Goncharov, V.K.
Gusakov, G.A.
Puzyrev, M.V.
Keywords: ЭБ БГУ::ТЕХНИЧЕСКИЕ И ПРИКЛАДНЫЕ НАУКИ. ОТРАСЛИ ЭКОНОМИКИ::Металлургия
ЭБ БГУ::ЕСТЕСТВЕННЫЕ И ТОЧНЫЕ НАУКИ::Физика
Issue Date: 2012
Publisher: Kovcheg
Citation: Plasma physics and plasma technology : Volume II (Sections 4-6), Minsk, 17–21 сентября 2012 года. – Minsk: Kovcheg, 2012. – P. 546-549
Abstract: The threshold of the aluminium target destruction has experimentally been determined. It is 8×106 W/cm2 in our conditions. The irradiation regime of the aluminium target has been found when in erosive laser plasma contains minimal number of the liquid drop phase particles of the target material formed by the hydrodynamical mechanism. The deposition regime of aluminium films is found, on which surface there are no liquid drop phase particles of the target material q=4.89×108 W/cm2.
URI: https://elib.bsu.by/handle/123456789/342823
Licence: info:eu-repo/semantics/openAccess
Appears in Collections:Кафедра интеллектуальных систем. Статьи

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