Microstructure of molibdenum-silicon surface layers formed by compression plasma flows

Abstract

Interaction of compression plasma flows (CPF) with metals and semiconductors is intensively studied for the last decade as an effective tool for synthesis of novel materials and their modification. Peculiarities of CPF-action are connected with high thermal power density transmitted to the target (up to 4-5 GW/m2) and relatively long duration of stable plasma flow (up to 200 μs). CPF treatment of binary and multicomponent materials results in the formation of supersaturated solid solutions, intermetallides, deep alloying, improvement of hardness and thermal stability of mechanical properties /1-3/. Thereupon one of promising research direction is connected with CPF action on binary “metalsilicon” systems and their use for the formation of metal silicides. The use of concentrated energy flows is effective for synthesis of refractory compounds, for example, molybdenum silicides that have broad range of applications due to their high melting point, low electrical resistance, high oxidation resistance and low density /4,5/.