Stability of ZrSiN nanocomposite films at air annealing

Abstract

Thin films on the basis of nitrides of transitional metals (TM) are widely used as hard protective coatings in the industry. One of the most important properties of the coatings for their practical application is their resistance to high temperature oxidation. For such severe conditions, most of the mononitride films cease to perform their protective function. For example, TiN coatings are rapidly oxidized at temperatures as low as 550 °C /1/. Increase in their thermal stability, oxidation and wear resistance is promoted by adding either metallic elements (Al, Zr, Ta, etc.) or nonmetallic elements such as Si or C. The incorporation of Si atoms into TiN, ZrN or CrN contributes to grain size refinement and the formation of a nanocomposite structure (grains of TM nitride surrounded by an amorphous SiNx phase), resulting in modification of mechanical properties together with enhanced thermal stability /2-4/. Unlike the Ti-Si-N system, the Zr-Si-N and Cr-Si-N films are less studied.