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https://elib.bsu.by/handle/123456789/340236| Title: | Influence of deposition parameters on structure and thermal stability of Ti-Al-n coatings prepared by reactive magnetron sputtering |
| Authors: | Klimovich, I.M. Komarov, F.F. Ljudchik, O.R. Zaikov, V.V. |
| Keywords: | ЭБ БГУ::ЕСТЕСТВЕННЫЕ И ТОЧНЫЕ НАУКИ::Физика ЭБ БГУ::ТЕХНИЧЕСКИЕ И ПРИКЛАДНЫЕ НАУКИ. ОТРАСЛИ ЭКОНОМИКИ::Электроника. Радиотехника |
| Issue Date: | 2015 |
| Publisher: | Kovcheg |
| Citation: | Plasma Physics and Plasma Technology : VIII International Conference, Minsk, Belarus, 14–18 сентября 2015 года. – Minsk, Belarus: Kovcheg, 2015. – P. 546-549 |
| Abstract: | Ti-Al-N coatings were obtained by reactive magnetron sputtering method under different deposition parameters (substrate temperature, bias voltage and reactive gas flow). Structure and elemental composition of films were determined by scanning electron microscopy and energy dispersive X-ray analysis, respectively. Thermal stability of Ti-Al-N coatings was studied by Raman spectroscopy after annealing in air at various temperatures (550 °C, 650 °C and 700 °C). It was found that selection of appropriate deposition parameters allows to obtain Ti-Al-N coating with improved thermal stability. |
| URI: | https://elib.bsu.by/handle/123456789/340236 |
| Licence: | info:eu-repo/semantics/openAccess |
| Appears in Collections: | Статьи сотрудников НИИ ПФП |
Files in This Item:
| File | Description | Size | Format | |
|---|---|---|---|---|
| Климович.pdf | 574,88 kB | Adobe PDF | View/Open |
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