The Influence of the Atomic Part of Metal on the Surface Roughness and Electrical Resistance of Fullerite–Bismuth Films

Abstract

Atomic force and scanning electron microscopy, X-ray spectral microanalysis, X-ray phase analy-sis, and Raman scattering of light were used to study the surface morphology and elemental and phase com-position, as well as the electrical resistance, of fullerite–bismuth films with different molecular flows on sub-strates of oxidized monocrystalline silicon. The dependence of the size of structural elements, main param-eters of surface roughness, phase composition, and electrical resistance of films on the atomic fraction of bismuth has been established.