Gigantic Magnetoresistive Effect in n-SiSiO2Ni Nanostructures Fabricated by the Template-Assisted Electrochemical Deposition

Abstract

The study of the carrier transport and magnetotransport in n-Si/SiO2/Ni nanostructures with granular Ni nanorods embedded into the pores in SiO2 was performed over the temperature range 2 – 300 K and at the magnetic field induction up to 8 T. In n-Si/SiO2/Ni nanostructures at temperatures of about 25 K a huge positive MR effect is observed. Possible mechanisms of the effect is discussed.