Hypereutectic silumin modification by ion-electron-plasma method

Abstract

In this paper, hypereutectic silumin (22-24 wt/%) was used. The structure was studied before modification. It is represented by primary silicon grains with a size of about 100 μm. Intermetallic compounds are also non-uniform distributed. After modification by an electron beam, the crystallite size was 0.4-0.5 μm. There are several layers. The modification depth was 130 μm. Hardness increased in 1.7 times, wear resistance in 1.2 times. Also, in this paper, data was given on the variation of the elementary composition with respect to the depth of the sample. The film was melt into the surface of the sample by an electron beam after depositing. The hardness increased by 1.7 times, the wear resistance increased in 2.6 times in comparison with the untreated samples. The coefficient of friction was 0.39