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Please use this identifier to cite or link to this item: https://elib.bsu.by/handle/123456789/256176
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dc.contributor.authorАндреев, А. Д.-
dc.contributor.authorБорздов, В. М.-
dc.contributor.authorДитковский, В. М.-
dc.date.accessioned2021-02-12T12:53:52Z-
dc.date.available2021-02-12T12:53:52Z-
dc.date.issued1993-
dc.identifier.citationВестник Белорусского государственного университета. Сер. 1, Физика. Математика. Механика. – 1993. – № 3. – С. 27-29.ru
dc.identifier.issn0321-0367-
dc.identifier.urihttps://elib.bsu.by/handle/123456789/256176-
dc.description.abstractIt is considerated influence of the drain voltage, dopant concentration, mean free path of the hot electrons in the MOSFET channel for temperature interval. It is noted that for conduction of acceleration tests is not necessary to stabilize temperature of the devicesru
dc.language.isoruru
dc.publisherМинск : Университетскоеru
dc.rightsinfo:eu-repo/semantics/openAccessen
dc.subjectЭБ БГУ::ЕСТЕСТВЕННЫЕ И ТОЧНЫЕ НАУКИ::Физикаru
dc.titleОценка параметров, влияющих на ток подложки и деградацию МОП-ПТ в режиме разогрева электроновru
dc.typearticleru
dc.rights.licenseCC BY 4.0ru
Appears in Collections:1993, №3 (сентябрь)

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