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Please use this identifier to cite or link to this item: https://elib.bsu.by/handle/123456789/223120
Title: Высокоэнергетичная ионная имплантация в алмаз
Authors: Филипп, А. Р.
Keywords: ЭБ БГУ::ЕСТЕСТВЕННЫЕ И ТОЧНЫЕ НАУКИ::Физика
Issue Date: 1997
Publisher: Минск : Універсітэцкае
Citation: Вестник Белорусского государственного университета. Сер. 1, Физика. Математика. Информатика. – 1997. – № 2. – С. 22-26.
Abstract: Some peculiarities of defect production in diamond irradiated with high energy ions have been investigated. Defect structure in subsurface layer and in the layer located deeper than projected ion range are considered on a basis of ion track production and defect diffusion, respectively.
URI: http://elib.bsu.by/handle/123456789/223120
ISSN: 0321-0367
Sponsorship: Данная работа была частично профинансирована в рамках проекта INTAS-94-1982.
Licence: info:eu-repo/semantics/openAccess
Appears in Collections:1997, №2 (май)

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