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Поле DC | Значение | Язык |
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dc.contributor.author | Zukowski, P. | - |
dc.contributor.author | Koltunowicz, T. | - |
dc.contributor.author | Partyka, J. | - |
dc.contributor.author | Fedotova, J. | - |
dc.contributor.author | Larkin, A. | - |
dc.date.accessioned | 2016-06-15T12:35:50Z | - |
dc.date.available | 2016-06-15T12:35:50Z | - |
dc.date.issued | 2009-05 | - |
dc.identifier.citation | Hopping conductivity of metal-dielectric nanocomposites produced by means of magnetron sputtering with the application of oxygen and argon ions / P. Zukowski, T. Koltunowicz, J. Partyka, J. Fedotova, A. Larkin // Vacuum. - 2009. - Vol. 83, Suppl. 1. - P. S280 - S283 | ru |
dc.identifier.uri | http://elib.bsu.by/handle/123456789/152039 | - |
dc.description.abstract | Testing of electrical properties of nanocomposites (Co0,45Fe0,45Zr0,1)x + (Al2O3)1+x within the concentration range of 0.30 < x < 0.65, produced by means of magnetron sputtering of a target composed of stripes of metallic alloy and dielectric, has been carried out. It has been found that the studied materials contain metallic nanoparticles of a diameter ranging from 6 to 10 nm. Alternating current conduction at x < 0.50 is realized by hopping mechanism while at x > 0.50 metallic conductivity is observed. The obtained results have been analyzed using a model of hopping conductivity in the egime developed earlier. This analysis allowed to extract dependences of activation energy ΔEτ and times τ in a hopping regime after isochronous (15 min) thermal annealings within the range from 293 K to 673 K. | ru |
dc.language.iso | en | ru |
dc.publisher | Elsevier B.V. | ru |
dc.subject | ЭБ БГУ::ЕСТЕСТВЕННЫЕ И ТОЧНЫЕ НАУКИ::Физика | ru |
dc.title | Hopping conductivity of metal-dielectric nanocomposites produced by means of magnetron sputtering with the application of oxygen and argon ions | ru |
dc.type | article | ru |
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