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dc.contributor.authorApanasovich, V. V.-
dc.contributor.authorBaranouski, A. K.-
dc.description.abstractImpact ionization was simulated in thin multiplication region ~(0.1ч0.2)·10-4 cm confined by cylinder microplasma volume with using particle-based method. Direct calculation of Coulomb repulsion between avalanche electrons is distinctive feature of this simulation. Avalanche spatial bounds were analyzed depending on angle of scattering and electric field intensity. Microplasma pulse width dependence on angle of scattering was introduced. Determined microplasma pulse width enables to evaluate dead time in random number generators.ru
dc.publisherМинск: БГУru
dc.subjectЭБ БГУ::ОБЩЕСТВЕННЫЕ НАУКИ::Информатикаru
dc.titleParticle-Based Simulation Of Electron Avalanche In Silicon Microplasmaru
Appears in Collections:2004. Международная конференция “Моделирование процессов и систем”

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