Please use this identifier to cite or link to this item:
https://elib.bsu.by/handle/123456789/50846Full metadata record
| DC Field | Value | Language |
|---|---|---|
| dc.contributor.author | Doudkin, A. | - |
| dc.contributor.author | Vershok, D. | - |
| dc.date.accessioned | 2013-11-05T08:38:29Z | - |
| dc.date.available | 2013-11-05T08:38:29Z | - |
| dc.date.issued | 2004 | - |
| dc.identifier.uri | http://elib.bsu.by/handle/123456789/50846 | - |
| dc.description.abstract | The integrated circuit and photomask images processing technology is proposed. This technology allows to perform the restoration of the integrated-circuit metallization layout and the mask artwork from the images of IC metallization layers or photomask set correspondingly. It can be applied for the tasks of integrated circuits redesign and automated visual inspection of integrated circuits and photomask production. | ru |
| dc.language.iso | en | ru |
| dc.publisher | Минск: БГУ | ru |
| dc.subject | ЭБ БГУ::ОБЩЕСТВЕННЫЕ НАУКИ::Информатика | ru |
| dc.title | Integrated Circuit (Ic) And Photomask Images Processing Technology | ru |
| dc.type | Article | ru |
| Appears in Collections: | 2004. Международная конференция “Моделирование процессов и систем” | |
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