Structural, Optical, and Electrophysical Properties of La0,13Bi0,87FeO3 Films Obtained by High-Frequency Laser Evaporation in Vacuum

Abstract

Nanostructured thin films on a silicon substrate were obtained by the action of high-frequency repetitively pulsed f ~ 10–13 kHz laser radiation with wavelength λ = 1.064 μm and power density q = 57 MW/cm2 on an La0.13Bi0.87FeO3 target at a pressure in the vacuum chamber p = 4.6 Pa. The morphology of the La0.13Bi0.87FeO3 thin films was studied using atomic force microscopy. Transmission spectra of the films in the visible and near- and mid-IR regions were obtained. The electrophysical characteristics of the La0.13Bi0.87FeO3 structures were analyzed.