Logo BSU

Please use this identifier to cite or link to this item: https://elib.bsu.by/handle/123456789/203876
Title: Исследование кинетики процесса удаления фоторезистивных покрытий с полупроводниковых пластин в объеме плазмы СВЧ разряда
Other Titles: The kinetics process investigation of photoresistive coating removing from semiconductor plates in plasma volume of the microwave discharge / S.V.Bordusov
Authors: Бордусов, С. В.
Keywords: ЭБ БГУ::ЕСТЕСТВЕННЫЕ И ТОЧНЫЕ НАУКИ::Физика
Issue Date: 2001
Publisher: Минск : БГУ
Citation: Взаимодействие излучений с твердым телом: материалы IV Междунар. науч. конф., 3-5 окт. 2001 г., Минск. — Мн.: БГУ, 2001. — С. 64-66
Abstract: Представлены результаты анализа динамики процесса удаления фоторезистивных плёночных защитных покрытий в объеме плазмы СВЧ разряда в кислороде и характера изменения интенсивности свечения спектральной линии 01 (Л=844,6 нм), используемой для контроля за удалением фоторезиста в случае обработки большого количества кремниевых пластин.
Abstract (in another language): The method of optical emission spectroscopy was used to investigate the process of removing photoresistive film coatings from the surface of semiconductor plates in plasma volume of the microwave discharge in oxygen. The correlation dependence between the alteration of the line OI(A=844,6 nm) intensity character and the photoresistive coating state during microwave processing was found out. The line OI(A=844,6 nm) was chosen because it is used in photoresist removing process control during ashing in the volume of microwave discharge. The received results show that the processes in the volume of microwave discharge has a specific features in comparison with the same processes In the high frequency discharge. This differences are caused by the high chemical activity of microwave plasma, considerable absorbing of microwave energy by material of semiconductor plates, the higher degree of skinning microwave electromagnetic field in plasma etc. The submitted results will be useful in the development of technological processes of plasmachemical photoresist coating removing in microwave discharge devices of various types.
URI: http://elib.bsu.by/handle/123456789/203876
ISBN: 985-445-236-0
Appears in Collections:2001. Взаимодействие излучений с твердым телом

Files in This Item:
File Description SizeFormat 
64-66.pdf731,03 kBAdobe PDFView/Open


PlumX

Items in DSpace are protected by copyright, with all rights reserved, unless otherwise indicated.