Ионно-ассистируемое осаждение слоев металлов в процессе распыления конических мишеней ионным пучком

Abstract

The featured and easy-to-use IBAD technique was proposed in order to realise in situ ion implantation and different material layer deposition on metals by the same ion beam. The developed simulation software enabled us to describe IBAD process as well as to calculate the radial and depth distributions of deposited/implanted atoms. These programs are especially effective ones to describe and control a procedure for ion beam assisted sputter coating of the inner walls of tubes. There is a reasonable agreement of theoretical predictions and experimental results for the deposition efficiency coefficient.