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Preview | Issue Date | Title | Author(s) |
---|---|---|---|
2014 | Threshold and criterion for ion track etching in SiO2layers grown on Si | Vlasukova, L. A.; Komarov, F. F.; Yuvchenko, V. N.; Wesch, W.; Wendler, E.; Didyk, A. Yu.; Skuratov, V. A.; Kislitsin, S. B. |
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