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Please use this identifier to cite or link to this item: https://elib.bsu.by/handle/123456789/182261
Title: Structure, phase composition and hardness of TiZrAlN films with different Al content
Authors: Uglov, V. V.
Saladukhin, I. A.
Abadias, G.
Daniliuk, A. Yu.
Zlotski, S. V.
Dub, S. N.
Issue Date: 2017
Publisher: Минск: Изд. центр БГУ
Citation: Взаимодействие излучений с твердым телом = Interaction of Radiation with Solids: материалы 12-й Междунар. конф., Минск, Беларусь, 19—22 сент. 2017 г. / редкол.: В.В. Углов (отв.ред.) [и др.]. — Минск: Изд. центр БГУ, 2017. — С. 355-357.
Abstract: Quaternary TiZrAlN films were grown at Ts=600°C by reactive magnetron sputtering in Ar+N2 plasma discharge from elemental targets. Deposition occurred at the constant power of Ti and Zr targets, while changing the Al power and adjusting the N2 flow rate, resulting in stoichiometric nitride films (N concentration ~ 50 at.%) with Al content up to 37 at.% and fixed Zr:Ti ratio of 1:1. It is shown that single-phase, cubic (Ti,Zr)1-xAlxN solid solutions are stabilized upon incorporation of Al. The lattice parameter of Al-containing films linearly decreases with the increase in Al concentration. For these films the maximum hardness (25 GPa) is achieved at Al content of 19 at.%
Description: Секция 5. Влияние излучений на структуру и свойства покрытий
URI: http://elib.bsu.by/handle/123456789/182261
ISBN: 978-985-553-446-5
Appears in Collections:2017. Взаимодействие излучений с твердым телом = Interaction of Radiation with Solids

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