Electrophysical properties of TiAlN coatings prepared using controlled reactive magnetron sputtering

Abstract

In this work, a study on the influence of deposition parameters on the structure and electrophysical properties of TiAlN coatings is presented. The optical properties of ‘Ti’-based nitride coatings can be tailored by controlling the stoichiometry, which affects the density of free electrons in the Ti d band. Incorporation of additional elements (such as Al) in the TiN matrix changes the bonding structure. The change in the bonding structure results in variations in the electrical resistivity and the optical properties of TiAlN. In the present study, TiAlN coatings were prepared by reactive magnetron sputtering. The algorithm of the optical control of the nitrogen flow for the processes of the magnetron deposition of the TiAlN films is used. The results of the determination of the optical characteristics and of the elemental composition of the films are considered.